Primelite’s UV-LED light sources replace mercury arc lamps in Wafer Edge Exposure.
Wafer Edge Exposure (WEE) is a prevalent process step in high-volume semiconductor fabrication using lithography steppers and scanners. Optimizing yield in advanced packaging setups (e.g., using 1X stepper technology) is the primary driver to install this additional high-intensity exposure step, which processes the wafer edge separately.
WEE equipment may be connected to a semiconductor wafer track as an independent unit or may be integrated directly into stepper equipment. It consists of a scanning and a wafer spinning device, as well as an optical system in combination with a powerful spot light source for shaped exposure.
Primelite’s ALE/1 systems are the perfect UV-LED solution for these wafer edge exposure applications, being the only UV-LED spot light source with high-power polychromatic output matching the relevant i-, h-, and g-line spectrum (365/405/435 nm) of a mercury arc lamp.
The multispectral properties of our UV-LED light source allow replacing mercury lamps with eco-friendly LED technology. Furthermore, our closed-loop feedback control system with instant ON/OFF (0 to 100% below 1 millisecond) ensures consistent and highly accurate exposure results. Tool downtime is reduced to a minimum, as the modular design of all our light sources make maintenance fast and easy.
ALE/1.3 for Wafer Edge Exposure
This version of the ALE/1 combines all wavelengths of the i-, h-, and g-line spectrum (365/405/435 nm) for broadband applications. Whether you want to switch between wavelengths or want to use a broader spectrum, the ALE/1.3 can provide you with the highest radiation output in the spectrum between 350 and 450 nm.
The ALE/1C can provide intensities of up that match and exceed 200 W, 350 W and 500 W lamps used in conventional Wafer Edge Exposure systems.
|Emitters||3 LEDs (365, 405, and 435 nm)1|
|Radiation output2 in mW||ALE/1||ALE/1+||ALE/1+|
|Light guide||Ø5.0 mm||Ø6.5 mm||Ø6.5 mm AR3|
|1 CWL of emitters: 367.5±2.5 nm, 402.5±2.5 nm, and 435.0±2.5 nm; 2 Full spectrum of each emitter measured at end of light guide (length 1.5 m); deviation of ±10% possible; 3 Light guides with antireflective coating available.|
Highlights – Why ALE/1 for UV-LED Wafer Edge Exposure Equipment
- Fiber-coupled UV-LED light source for easy integration
- Highest intensities up to 100,000 mW/cm²
- Single wavelength and broadband exposure / i-, h-, and g-line (350-450 nm)
- Stable, precise, consistent output due to closed-loop feedback control system
- Long lifetime and TCO benefits of UV-LED technology
- Improved operating safety unlike discharge lamps
- Future-proof mercury-free light source, no expensive waste disposal